The new fab’s cleanroom space is planned to be operational in stages beginning in 2025. Credit: Tada Images/Shutterstock.com.

US-based semiconductor manufacturing company Micron Technology has begun the construction of a new memory manufacturing fab in Idaho, US.

The commencement of construction marks the region’s first new manufacturing fab in the past two decades.

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Micron revealed its plans to invest around $15bn by the end of the decade to construct a new fab for leading-edge memory production, located nearby the company’s research and development (R&D) epicentre in Boise.

The project is expected to generate more than 17,000 new Idaho jobs, which includes 2,000 Micron direct jobs.

Micron president and CEO Sanjay Mehrotra said: “Our investments here and in New York will secure domestic memory production in the US, meeting the advanced applications of the future’s demands for the vast amounts of memory required for fast and efficient data storage and processing.”

The new fab’s cleanroom space is planned to be operational in stages beginning in 2025.

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Dynamic random access memory (DRAM) production will increase in the second half of the decade to meet the rising industry demand.

Upon completion, the cleanroom area will eventually exceed 600,000ft², and it is expected to be the largest single cleanroom constructed in the country.

Micron’s Idaho investment plans will be facilitated by the expected subsidies and credits offered by the CHIPS and Science Act.

In August 2023, the company submitted proposals to the US Department of Commerce’s CHIPS Programme Office for its Idaho and New York projects.

Boise Mayor McLean said: “In aiming to achieve 100% water reuse, recycling and restoration, as well as use 100% renewable electricity at the new facility, Micron’s leadership in keeping Boise a place we can all thrive shines through. The City of Boise and Micron are long-standing partners, and we’re excited for the next 45 years.”